Flash lamp annealing system

The Department of Physics is requesting a procurement for the purchase of a combined flash-lamp and rapid thermal annealing tool (FLA/RTA) to Lund Nano Lab (LNL). The combination of both RTA and FLA in the same tool is of greatest importance, at the same time as suitable size and capacity is vital to fit in LNL. The tool must have low base pressure, process gases, and max. temp. > 800 ˚C. The FLA part must allow for processing in the millisecond range with enough energy to melt semiconductors.