Sub-micron direct photolithography system
Kungliga Tekniska högskolan, STOCKHOLM
The Albanova Nanolab (ANL) at KTH requires a sub-micron photolithography system capable of direct writing in common photoresists with sub-micron resolution at high through-put.
The sub-micron direct photolithography system will be used by KTH-ANL to define micro- and nanoscale electrical and optical circuits in various photoresists for further processing and measurements. We require a direct writing (maskless) lithography system compatible with all common broadband and i-line photoresists capable of sub-micrometer minimum feature size at high through-put across a 4’’ wafer and sufficiently accurate second-layer and backside alignment to align exposures to structures made with an VOYAGER EBL system. Further, the system must come with some method of autofocusing during exposures and a temperature regulated, clean air box. This system will enable high pattern fidelity in the resist and substrate of choice, and would also allow advanced front-to-back wafer processing, a new and unique feature for the ANL.
(Meddelande om frivillig förhandsinsyn)
Ej angivet
2020-10-25
Meddelande om frivillig förhandsinsyn
Stockholms län
V-2020-0559