Kungliga Tekniska Högskolan, KTH Sub-micron direct photolithography system

Sub-micron direct photolithography system

Kungliga Tekniska högskolan, STOCKHOLM

The Albanova Nanolab (ANL) at KTH requires a sub-micron photolithography system capable of direct writing in common photoresists with sub-micron resolution at high through-put.

The sub-micron direct photolithography system will be used by KTH-ANL to define micro- and nanoscale electrical and optical circuits in various photoresists for further processing and measurements. We require a direct writing (maskless) lithography system compatible with all common broadband and i-line photoresists capable of sub-micrometer minimum feature size at high through-put across a 4’’ wafer and sufficiently accurate second-layer and backside alignment to align exposures to structures made with an VOYAGER EBL system. Further, the system must come with some method of autofocusing during exposures and a temperature regulated, clean air box. This system will enable high pattern fidelity in the resist and substrate of choice, and would also allow advanced front-to-back wafer processing, a new and unique feature for the ANL.

(Meddelande om frivillig förhandsinsyn)

Förfarande

Ej angivet

Publicerad

2020-10-25

Dokumenttyp

Meddelande om frivillig förhandsinsyn

Leveransorter

Stockholms län

Diarie-/referensnummer

V-2020-0559