Xenon diflouride etching system

The procurement

The system procured here will be used for XeF2 based reproduceable high selectivity isotropic etching of mainly silicon in applications varying from quantum devices to MEMS, specifically for releasing micro- and nanoscale devices. The system will be installed in a university user access cleanroom infrastructure with more than 200 users from academia and industry. This system is intended for university R&D and we expect that the offered systems are of table top size.